Introduction

I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials
I. Utke, H. Koops

I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping
Ph. Russell.


Part I. Fundamentals and Models

1. The theory of bright field electron and field ion emission sources
R.Forbes

2. How to select compounds for focused charged particle beam assisted etching and deposition
Tristan Bret, Patrik Hoffmann

3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment
Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke

4. Fundamentals of interactions of electrons with molecules
John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan

5. Simulation of focused ion beam milling
Heung-Bae Kim, Gerhard Hobler

6. FEB and FIB continuum models for one molecule species
Ivo Utke

7. Continuum modeling of electron beam induced processes
Charlene J. Lobo and Milos Toth

8. Monte Carlo method in EBID process simulations
Kazutaka Mitsuishi

Part II. Applications

Topical Reviews

9. Focused electron beam induced processing (FEBIP) for industrial applications
Thorsten Hofmann, Nicole Auth, Klaus Edinger

10. Focused Ion Beam and DualBeam™ technology applied to nanoprototyping
O. Wilhelmi, J.J.L. Mulders

11. Review of FIB-tomography
L. Holzer and M. Cantoni

12. In-situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing
I. Utke, M. G. Jenke, V. Friedli, J. Michler

13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles
Adam M. Zachary, Igor L. Bolotin, and Luke Hanley

Sensor Prototyping

14. Electron- and ion- assisted metal deposition for the fabrication of nanodevices based on individual nanowires
Francisco Hernández-Ramírez, Román Jiménez-Díaz, Juan Daniel Prades, Albert Romano-Rodríguez

15. Focused ion beam fabrication of carbon nanotube and ZnO nanodevices
Guangyu Chai, Oleg Lupan, and Lee Chow

16. Focused Ion and Electron Beam induced deposition of magnetic nanostructures
M.S. Gabureac, L. Bernau, I. Utke, A. Fernandez-Pacheco and J. M. DeTeresa

17. Metal films deposited by FIB and FEB for nanofabrication and nanocontacting purposes
A. R. Vaz, S.A. Moshkalev

Photonic Device Prototyping (chapter length about 15 pages)

18. FIB Etching for Photonic Device Applications
M.J.Cryan, Y-L.D.Ho, P.S.Ivanov, P.J.Heard, J.Rorison and J.G.Rarity

19. Gas assisted FIB etching of InP for rapid-prototyping of photonic crystals
Victor Callegari, Urs Sennhauser, and Heinz Jaeckel

20. Applications of FIB for rapid prototyping of photonic devices, fabrication of nano sieve, nanowire and nano antennas
V.J.Gadgil

21. Focused particle beam induced deposition of silicon dioxide
Heinz D. Wanzenboeck

Electrical Characterization

22. Growth and characterization of FEB-deposited suspended nanostructures
G. Gazzadi and S. Frabboni

23. Electrical transport properties of metallic nanowires and nanoconstrictions created with FIB
J.M. De Teresa, A. Fernández-Pacheco, R. Córdoba, M.R. Ibarra

24. Structure-property relationship in electronic transport on FEBID structures
Michael Huth

25. Characterization of nanostructured carbon materials using FIB
A. R. Vaz, C. Veríssimo, F.P. Rouxinol, R.V. Gelamo and S. A.Moshkalev

Electron Beam Lithography with new materials

26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes
Armin Goelzhaeuser

27. Nanofabrication using Electron Beam Lithography Processes
Antonio Carlos Seabra, Mariana Pojar and Simone Camargo Trippe

Prospectives

F-1. Focused beam processing - new beam technologies - new challenges in process development and nanofabrication
J. Melngailis, S. A. Moshkalev, I. Utke