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Published: 15 November 2012

688 Pages

7-1/2 x 9-1/4 inches

ISBN: 9780199861224

Also Available As:


Bookseller Code (04)

Companion website

Fabrication Engineering at the Micro- and Nanoscale

Fourth Edition

Stephen A. Campbell

The Oxford Series in Electrical and Computer Engineering

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, Fabrication Engineering at the Micro- and Nanoscale, Fourth Edition, covers the entire basic unit processes used to fabricate integrated circuits and other devices.

New to this Edition:

  • Coverage of many new topics including: - the flash and spike annealing processes - extreme ultraviolet (EUV) lithography - GaN epitaxial growth and doping - double exposure routes to sub-35-nm lithography - architectures for nanoscale CMOS as practiced at the 45-nm node - trigate or FINFET CMOS planned for 22 nm and below - bulk silicon and thin film solar cell manufacturing - GaN LED fabrication - microfluidics
  • Updated sections on nonoptical lithography
  • Expanded content on state-of-the-art CMOS
  • A Companion Website with PowerPoint slides of figures from the text (
  • An Instructor's Solutions Manual, available to registered adopters of the text (978-0-19-986121-7)

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